 |
| |
|
| |
 |
|
 |
The WACCO EEW 200 (Wafer Edge Exposure)
is a system to
exposure wafer edge with UV light source in a certain
recipe.
EEW 200 consists of pre-aligning module, exposure module
and a main
controller to control the whole system. |
|
| |
 |
|
◈ Compact Footprint
◈ High Reliable and Repeatable Positioning
◈ Fast Wafer Centering and Flat/Notch Zone Aligning (Non- contact
type)
◈ Class 1 Clean Room Compatible
◈ Fastest Cycle Time(High Throughput)
◈ Easy to Use and Install |
|
| |
 |
|
| Item |
Specifications |
| Dimension |
300(W)x456(D)x510(H) |
| Wafer Size |
200mm Notch/Flat Type |
| Exposure Mode |
Round, Linear, Step |
| Wavelength |
243, 365 mm |
| Exposure Width |
0.5 ~ 10 mm |
| Resist Slope |
≤ 10μm |
| Throughput |
Round : 120 Wfs/Hr
Round + Linear : 90 Wfs/Hr |
| Exposure Accuracy |
Centering : ± 0.05mm
Angle : ± 0.05˚ |
| Utility |
Power : 220VAC, 1φ , 50/60Hz
Vacuum Pressure : ≥ 600 mmHg |
|
| |
 |
|
 |
| |
|
 |
|
