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The WACCO EEW 200 (Wafer Edge Exposure)
is a system to
exposure wafer edge with UV light source in a certain
recipe.
¡¡
EEW 200 consists of pre-aligning module, exposure module
and a main
controller to control the whole system. |
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¢Â Compact Footprint
¢Â High Reliable and Repeatable Positioning
¢Â Fast Wafer Centering and Flat/Notch Zone Aligning (Non- contact
type)
¢Â Class 1 Clean Room Compatible
¢Â Fastest Cycle Time(High Throughput)
¢Â Easy to Use and Install |
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Item |
Specifications |
Dimension |
¡¡ 300(W)x456(D)x510(H) |
Wafer Size |
¡¡ 200mm Notch/Flat Type |
Exposure Mode |
¡¡ Round, Linear, Step |
Wavelength |
¡¡ 243, 365 mm |
Exposure Width |
¡¡ 0.5 ~ 10 mm |
Resist Slope |
¡¡ ¡Â 10¥ìm |
Throughput |
¡¡ Round : 120 Wfs/Hr
¡¡ Round + Linear : 90 Wfs/Hr |
Exposure Accuracy |
¡¡ Centering : ¡¾ 0.05mm
¡¡ Angle : ¡¾ 0.05¢ª |
Utility |
¡¡ Power : 220VAC, 1¥õ , 50/60Hz
¡¡ Vacuum Pressure : ¡Ã 600 mmHg |
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