The WACCO EEW 200 (Wafer Edge Exposure) is a system to
exposure wafer edge with UV light source in a certain recipe.
 
EEW 200 consists of pre-aligning module, exposure module
and a main controller to control the whole system.
 
◈ Compact Footprint
◈ High Reliable and Repeatable Positioning
◈ Fast Wafer Centering and Flat/Notch Zone Aligning (Non- contact type)
◈ Class 1 Clean Room Compatible
◈ Fastest Cycle Time(High Throughput)
◈ Easy to Use and Install
 
Item Specifications
Dimension   300(W)x456(D)x510(H)
Wafer Size   200mm Notch/Flat Type
Exposure Mode   Round, Linear, Step
Wavelength   243, 365 mm
Exposure Width   0.5 ~ 10 mm
Resist Slope   ≤ 10μm
Throughput   Round : 120 Wfs/Hr
  Round + Linear : 90 Wfs/Hr
Exposure Accuracy   Centering : ± 0.05mm
  Angle : ± 0.05˚
Utility   Power : 220VAC, 1φ , 50/60Hz
  Vacuum Pressure : ≥ 600 mmHg